**Contents of JSA Vol.14 No.4 (2008) 292 - 475**

*Proceedings of PSA-07 (International Symposium on Practical Surface Analysis)*

November 25-28, 2007, Kanazawa, Japan

November 25-28, 2007, Kanazawa, Japan

# Preface

S. Tanuma・・・・292

# Plenary

Surface Characterization in Biomaterials Applications*(Invited)*

H. J. Mathieu・・・・293

# 10th Anniversary of Powell Prize

Growth and Trends in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy*(Review, Invited)*

C. J. Powell・・・・299

Sputtering, Cluster Primary Ions and Static SIMS

*(Invited)*

M. P. Seah・・・・305

# Theory/Simulation

Database construction of Secondary electron emission - Monte Carlo approach combined with supplementary experiment -*(Special lecture, Korea-Japan Symposium)*

*T. Iyasu and R. Shimizui・・・・312

Theory of High-energy Phtotemission

*(Invited)*

T. Fujikawa・・・・316

Dynamic Monte Carlo Simulation for High Resolution Depth Profiling of Si/Ge Multilayer Film

*(Invited)*

*H. J. Kang, J. S. Jang, N. S. Park, K. J. Kim and H. I. Lee・・・・322

Relativistic Spin-Polarized X-ray Photoelectron Diffraction Theory from Heavy Elements

*K. Ito, T. Konishi and T. Fujikawa・・・・328

Theoretical Study of Plasmon Loss Peaks in Core-level Photoemission Spectra: Energy and Angular Dependence

*H. Shinotsuka, T. Uwatoko, T. Konishi and T. Fujikawa・・・・332

Depth Distribution of Photoelectron Yield Calculated by Multiple Scattering Theory

*H. Shinotsuka, H. Arai and T. Fujikawa・・・・336

Theoretical analysis of AES of 2

^{nd}periodic element containing substances

*Y. Takagi, K, Takaoka, S. Shimada, K. Endo, K. Kato, T. Ida and M. Mizuno・・・・340

XPS Spectral Simulation of Chitosan in Thermal Decomposition Process

*K. Tamura, K. Endo, Y. Takagi, K. Kato, D. Matsumoto, T. Ida, M. Mizuno, Y. Suzuki, K. Takahashi, K. Uchida and H. Yajima・・・・344

X-Ray Photoelectron Spectral Analysis for Carbon Allotropes

*K. Endo, D. Matsumoto, Y. Takagi, S. Shimada, T. Ida, M. Mizuno, K. Goto, H. Okamura, N. Kato and K. Sasakawa ・・・・348

Theoretical Study of Multi-atom Resonant Photoemission

*H. Arai and T. Fujikawa・・・・352

# Data analysis/Treatment

Common Data Processing System for ISO Standards*(Invited)*

K. Yoshihara・・・・356

A background subtraction program for photo- and Auger electron spectra

M. Jo・・・・360

Performance analysis of algorithms to detect peaks in XPS spectra

*Y. Furukawa, N. Ikeo , Y. Nagatsuka, M. Yoshitake and A. Tanaka・・・・365

# Application/bio-material, organic material

Surface Analysis of Biomolecules: Unravelling biointerfacial interactions*(Invited)*

*S. L. McArthur, G. J. S. Fowler and G. Mishra・・・・370

# TOF SIMS

Development of a Standards Base for Static SIMS*(Invited)*

I. S. Gilmore・・・・376

Oxidation Process of Phosphite Antioxidants Monitored by ToF-SIMS

*Y. Abe and H. Yamauchi・・・・383

Secondary ion mass spectrometry using size-selected gas cluster ion beam

* M. Hashinokuchi, K. Moritani, J. Nakagawa, T. Kashiwagi, N. Toyoda and K. Mochiji・・・・387

# Application

Surface and Interface Analysis using High Energy Electron Spectroscopy*(Invited)*

L. Kövér・・・・391

XPS: Issues with Data Acquisition and Data Processing

*(Invited)*

J. T. Grant・・・・398

Applying Surface Analysis in Electronics Materials Processing

*(Review, Invited)*

W. F. Stickle・・・・406

In-situ Characterization of MgO Surface with Discharge Aging at Elevated Temperatures of AC-Plasma Display Panels

*(Invited, Korea-Japan Symposium)*

M. H. Joo, K. H. Park and *J. W. Lee・・・・412

Analysis of SiO

_{2}Films on Si Substrate by GD-OES Depth Profiling and GIXR Measurements

*S. Suzuki, S. Sato and K. Kakita・・・・416

Study of Implanted B

^{+}and P

^{+}Ions into Si(100) for Ultra Shallow Junction by SIMS

*Y. S. Lee, W. J. Lee, M. H. Lee and S. K. Rha・・・・420

Electronic Structure of the Bulk of Titanium Hydrides Fractured in Ultrahigh Vacuum by XPS Surface Analysis

*B. Tsuchiya, M. Oku, R. Sahara, S. Nagata, T. Shikama and Y. Kawazoe・・・・424

Lateral Resolution of EDX Analysis with Low Acceleration Voltage SEM

*S. Hashimoto, T. Sakurada and M. Suzuki・・・・428

Photoelectron spectrometer equipped with open counter for electronic structures of organic materials

*D. Yamashita, Y. Nakajima, A. Ishizaki and M. Uda・・・・433

Si Wafer Surface Etched by Water Droplet Cluster Ion Analyzed with SEM, SPM and XPS

*Y. Iijima, M. Kudo, Y. Sakai and K. Hiraoka・・・・437

Dopant Profiling on 4H Silicon Carbide P

^{+}N Junction by Scanning Probe and Secondary Electron Microscopy

*O. Ishiyama and S. Inazato・・・・441

Characterization of Pd(PVP) nanoparticles studied by AFM, Pd L

_{3}-edge and Cl K-edge NEXAFS

*S. Yagi, T. Ashida, T. Nomoto, H. Namatame and M. Taniguchi・・・・444

Temperature dependence of Er nano structure on InP(001)

T. Mochizuki, *S.Yagi, M. Kato, K. Soda, H. Namatame and M. Taniguchi・・・・449

Coadsorption behavior of (CH

_{3})

_{2}S with H

_{2}O or D

_{2}O on Rh(100) studied by XPS and NEXAFS

*T. Nomoto, S. Yagi, K. Soda, H. Namatame and M. Taniguchi・・・・453

Reaction of L-cysteine on Rh(PVP) nanoparticle surface by NEXAFS

*S. Gohda, T. Ashida, S. Yagi, H. Namatame and M. Taniguchi・・・・458

Dissociation reaction of (CH

_{3})

_{2}S adsorbed on Pd nanoparticles fabricated by gas evaporation method

*M. Morihara, K. Miura, T. Nomoto and S. Yagi・・・・462

Extremely Smooth Surface Etching by Giant Cluster Ion Impact

*Y. Sakai, Y. Iijima, K. Mori and K. Hiraoka・・・・466

Implant dose measurement and depth profiling of 10-keV implanted As by high-resolution RBS

*C. Ichihara, A. Kobayashi and K. Kimura・・・・469

Member of the Committee of PSA-07

・・・・・・・・・・・・473